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meeting on industrial radiation and radioisotope measurement applications (IRRMA), Raleigh, NC, 1999 Chettle, DR, Fleming, DEB, McNeill, FE and Webber, CE Serum (plasma) lead, blood lead, and bone lead Am J Ind Med 1997;32:319 20 Christoffersson, J-O and Mattsson, S Polarised X-rays in XRF-analysis for improved in vivo detectability of cadmium in man Phys Med Biol 1983;28:1135 44 Chuang, HY, Schwartz, J, Gonzales-Cossio, T, Lugo, MC, Palazuelos, E, Aro, A, Hu, H and Hernandez-Avila, M Interrelations of lead levels in bone, venous blood, and umbilical cord blood with exogenous lead exposure through maternal plasma lead in peripartum women Environ Health Perspect 2001;109:527 32 Currie, LA and Svehla, G Nomenclature for the presentation of results of chemical analysis (IUPAC Recommendations 1994) Pure Appl Chem 1994;66:595 608 Drasch, G.

Assuming that vRF = vRFo cos ( RF t + ), vLO = vLOo cos LO t , then, iL = a2 4vRFo vLOo [ cos {( RF + LO ) t + } + cos {( RF LO ) t + }] a4 8vRFo vLOo [ cos {( RF + LO ) t + } + cos {( RF LO ) t + }] 2 2 [vRFo {1 + cos 2 ( RF t + )} + vLOo {1 + cos 2 LO t}] . . . or

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Die anthropogene Blei- und Cadmiumbelastung des Menschen Untersuchungen an Skelett- und Organmaterial, Habil-Schrift, M nchen, 1983 u Elreedy, S, Krieger, N, Ryan, PB, Sparrow, D, Weiss, ST and Hu, H Relations between individual and neighbor-hoodbased measures of socioeconomic position and bone lead concentrations among community-exposed men: the Normative Aging Study Am J Epidemiol 1999;150:129 41 Erfurth, EM, Gerhardsson, L, Nilsson, A, Rylander, L, Sch tz, A, Skerfving, S and B rjesson, J Effects of lead on u o the endocrine system in lead smelter workers Arch Environ Health 2001;56: 449 55 Evans, RO The Atomic Nucleus McGraw-Hill, New York, 1955, pp 677 84 Farquharson, MJ and Bradley, DA The feasibility of a sensitive low-dose method for the in vivo evaluation of Fe in skin using K-shell x-ray uorescence (XRF) Phys Med Biol 1999;44:955 65.

CrossReference 39, Replicating Data, explains the various replication models and how to set up replication.

Alternate methods for drawing lines include horizontal, vertical, angle, and infinite lines. The interface for these options appears in the PropertyManager, as shown in Figure 3.4.

Farquharson, MJ, Bagshaw, AP, Porter, JB and Abeysinghe, RD The use of skin Fe levels as a surrogate marker for organ Fe levels, to monitor treatment in cases of iron overload Phys Med Biol 2000;45: 1387 96 Feldstein, H, Cohen, Y, Shenberg, C, Klein, A, Kojller, M, Maenhaut, W, Cafmeyer, J and Cornelis, R Comparison between levels of trace elements in normal and cancer inoculated mice by XRF and PIXE Biol Trace Elem Res 1998;61:169 80 Fernandez, JE, Hubbell, JH, Hanson, AL and Spencer, LV Polarization effects on multiple scattering gamma transport Radiat Phys Chem 1993;41:579 630 Fleming, D Human lead metabolism: chronic exposure, bone lead and physiological models PhD Thesis McMaster University, Hamilton, Ontario, Canada (1998) Fleming, DEB Construction of a K X-ray uorescence bone lead system.

Assume that F has a strictly positive density f. We insert Ft = (1-t)F+tG for F in (3.69) and take the derivative d / d t (denoted by a dot) at t = 0. This gives

Abstract at 4th topical meeting on industrial radiation and radioisotope measurement applications (IRRMA), Raleigh, NC, USA, 1999 Fleming, DE and Forbes, TA Calibration and characterization of a digital X-ray uorescence bone lead system Appl Radiat Isot 2001;55:527 32..

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The page scan rate will be higher. Free memory will be larger. Scan rates will be close to zero unless there is a systemwide memory shortage.

Of course, the attenuation of the interference depends on the width and depth of the ditch. The wider and deeper the ditch, the more attenuated the interference. In practical layouts, the area of the IC die and its cost increase as the width of the ditch increases. Too wide a ditch and the cost may be pumped up to an unaffordable level. Additionally, the mechanical rigidity of the IC die is affected by the depth of the ditch. Too deep a ditch and the IC die may be easily damaged. Besides, this trenching increases the complexity of IC processing. Nevertheless, in the early stages of RFIC development, much effort was placed on researching the topic of ditch width and depth.

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